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OES - Optical Emission Spectra
OES and endpoint detection shall be introdued. OES is a valuable diagnostic and gives details of the reactions in the plasma.
 OES allows endpoint control by monitoring a species which is sensitive to the films and either the etching gas or the by-products. As a film clears by-product species would decrease strongly. |  Each different film has its own unique spectral signal. Processes are generally set-up by timed etch steps after which OES can be applied. Over etch steps can be set up as a % of ME or as a timed step. |  |
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