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Commonly seen etch chambers.
This section shows simplified schematics highlighting the many differences seen in chamber types.
 The different types of plasma sources and typical plasma density for each. |  ICP in the cylindrical configuration. |  Planar coil. |
|---|---|---|
 Planar, Lam Syndion, TSV. |  ICP in the planar coil configuration. Mesh configuration to stop ions. R&D application. |  The principle of ICP is e/m induction. |
 Even has a Maxwell equation :) ... |  Equivalent circuit |  Simplified schematic. |
 ECR chamber and key components. |  Simple ECR schematic. |
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